发明名称 APPARATUS FOR DETECTING HAZES OF PHOTOMASK SURFACE USING WHITE-LIGHT SCANNING INTERFEROMETER AND METHOD FOR DETECTING THEREOF
摘要 An apparatus and method for detecting hazes of photomask surface using a white-light scanning interferometer is provided to reduce time for judging the generation of hazes using additional inspection equipment. An apparatus and method for detecting hazes of a photomask surface using a white-light scanning interferometer comprises a laser(10), a beam forming telescope(13), a homogenizer(14), a focus optical system(15), an energy detector(18), a haze detector(30), and a microscope(20). The laser emits the beam of large output. The beam forming telescope decides the form of the beam. The homogenizer forms the intensity of beam with uniformed energy distribution. The focus optical system makes the beam focused, and decides the size of beam. The energy detector measures in real time the intensity of energy of the beam reached at the photomask using a beam splitter. The haze detector is operated by a white-light scanning interferometer which detects in real time the generation of hazes. The microscope controls the change of the photomask surface and the position of the hazes generated.
申请公布号 KR20070087806(A) 申请公布日期 2007.08.29
申请号 KR20050123003 申请日期 2005.12.14
申请人 NANO ELECTRO OPTICS CO., LTD. 发明人 WEE, HAE SUNG;KIM, JONG SOO;LEE, CHANG WHAN
分类号 G01N21/45;G01N21/88 主分类号 G01N21/45
代理机构 代理人
主权项
地址