An etching device is provided to manufacture the substrate having high density circuit with the high yield by accelerating the etching liquid flow on the substrate by using the inhaler and the ejector. A substrate is supported by a substrate support(210). A blow nozzle(230) sprays the etching liquid on the substrate. An inhaler(250) is arranged at the outer circumference of the substrate support in order to collect the etching liquid. An ejector(270) is arranged to be faced with the inhaler and sprays the supplement fluid to the substrate. A sub-nozzle(290) is arranged to be adjacent to the blow nozzle and sprays the supplement fluid onto the substrate.
