| 摘要 |
<p>PURPOSE:To obtain a diffraction grating for color sepn. having the structure with which the formation of steps to a uniform and accurate height is easy in production by forming plural layers of films consisting of materials different from each other on a substrate and successively etching a part of plural layers of these films to a staircase shape. CONSTITUTION:Plural layers of the films 21, 22 consisting of the materials different from each other are formed on the substrate 20 and a part of plural layers of the films 21, 22 are successively etched to the staircase shape, by which the diffraction grating for color sepn. is constituted. Namely, the diffrac tion grating is formed by successively etching plural layers of the films 21, 22 and the etching depth can be easily regulated to the film thickness component and the determination of the height of the staircase by the film thickness is enabled by combining the materials having high selection rates of etching with each other to form plural layers of the films 21, 22. The specified height of the steps between the elements is, therefore, obtd. Thus, the easy formation of the steps of the diffraction grating for color sepn. to the uniform and accu rate height is possible in production and the color sepn. performance is greatly improved.</p> |
