LOW EMISSIVITY SUBSTRATE, AND PREPARATION METHOD THERE OF

摘要

The present invention relates to a low-radiation substrate comprising a crystalline infrared light reflective layer, and a dielectric layer by being surface treated with an electronic beam induced from a plasma; and to a manufacturing method thereof. A surface of a low-radiation substrate manufactured by a sputtering method is treated with an electron beam induced from a plasma, and the manufactured low-radiation substrate includes a crystalline infrared light reflective layer, and a dielectric layer. Thus, the low-radiation substrate according to the present invention has excellent visible ray transmittance, and reflectivity of infrared light. Also, the manufacturing method of a low-radiation substrate can be easily applied to a conventional low-radiation substrate, and can treat a surface having a large area, thereby having economical advantages.