METHOD FOR MANUFACTURING DOPANT DOPED SILICON NANO MATERIAL AND LOCAL DOPING METHOD THEREOF

摘要

The present invention relates to a method for preparing a dopant-doped silicon nanomaterial and a method for locally doping the same. The method for preparing a dopant-doped silicon nanomaterial comprises: a mixture powder injecting step of injecting a mixture powder of silicon and a dopant into an inductively-coupled plasma device; a plasma generating step of generating plasma by supplying pulse-type high energy RF power to the inductively-coupled plasma device; an ionizing step of ionizing the mixture powder with the plasma; a step of turning off the pulse-type high energy RF power and spraying a quenching gas when the mixture power is ejected from an inductively-coupled plasma torch in an ionized gas state; and a nanopowder forming step of forming a dopant-doped silicon nanopowder by recrystallizing the ionized mixture powder with the quenching gas.