发明名称 |
PROCESS AND APPARATUS FOR WASTE GAS TREATMENT BY MULTI-STAGE ELECTRON BEAM IRRADIATION |
摘要 |
The appts. is provided with irradiation chambers in multiple stages with the distance (m) between the centres of electron beam generation apts. set greater than a distance calculated in accordance with an equation: X = 2 alpha + tV (where 2 is a distance over which an absorbed dose spreads in the exhaust gas, t is a residence time (second) of the exhaust gas in a non-irradiation range and V is a flow rate (m/s) of the exhaust gas), and the electron beams are caused to pass through each irradiation range. t can be kept in the range of 0.01-0.5 seconds. |
申请公布号 |
CA2047759(A1) |
申请公布日期 |
1991.06.23 |
申请号 |
CA19902047759 |
申请日期 |
1990.12.25 |
申请人 |
EBARA CORPORATION |
发明人 |
NAMBA, HIDEKI;TOKUNAGA, OKIHIRO;SATO, SHOICHI;AOKI, SHINJI;SUZUKI, RYOJI;IZUTSU, MASAHIRO;OKAMOTO, KYOICHI |
分类号 |
B01D53/34;B01D53/00;B01D53/32;B01D53/60;B01D53/74;B01J19/08;C01B17/60;(IPC1-7):B01D53/34 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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