| 摘要 |
PURPOSE:To enhance the sensitivity, definition and dry etching resistance of the resist by incorporating a specific copolymer into the compsn. CONSTITUTION:The copolymer which contains 10 to 85% repeating unit of formula I and 15 to 90% repeating unit of formula II and has 2,000 to 1,000,000 weight average mol. wt. is incorporated into this compsn. In the formula, R1 denotes halogen or 1 to 12C alkyl halide; R2, R3 denote H, halogen, 1 to 12C alkyl halide; R4, R8 denote H or 1 to 3C alkyl; R5 denote H or 1 to 12C alkyl; R6, R7 denote 1 to 12C alkyl. Copolymers of alkyl chloride and para-t-butoxy styrene, etc., are usable as the above-mentioned copolymer. |
