Verfahren zur Herstellung von Siliciumtetrafluorid

摘要

1322843 SiF 4 ; SiO 2 CITIES SERVICE CO 30 June 1971 [1 July 1970] 30568/71 Heading C1A Silicon tetrafluoride is generated by passing a mixture of HF and water through a pervious bed of silica and reacting the HF in both vapour and liquid phases with the silica in the bed at a temperature about the dew point of the reaction mixture, said liquid phase being vaporized at about the same rate that it is introduced into the bed and recovering a vapour mixture comprising SiF 4 and water. The water/HF mixture has a preferred molar ratio in the range 0À5- 8À5 : 1 and the bed may be composed of crystalline silica particles and the temperature of the reaction mixture in the bed is preferably maintained at a temp. below 250‹ F. but high enough to prevent discharge of a substantial amount of liquid from the bed. The HF water mixture may be derived from aqueous HF or aqueous H 2 SiF 6 or their mixtures and may be charged on a single wet vapour stream or as separate streams of liquid and of vapour. The SiF 4 containing product vapour may be hydrolysed in the vapour phase for the production of fumed silica by heating to a temperature in excess of 1100‹ F.