| 摘要 |
PURPOSE:To prevent the back flow of atmosphere from an exhaust system into a reaction container in the manufacture of a non-oxygen-based film by providing a continuous exhaustion type turbo-molecular pump(TP) between the reaction container and a discontinuous-rotation type vacuum pump(VP). CONSTITUTION:Gate valves 44-47 are provided between each of reaction containers and a buffer chamber 102. Feeding nozzles 17 and 18 for reactive gas and exhaust nozzles 17' and 18' are provided in each reaction container. A holder 3 in which a substrate 1 is inserted is arranged in a first reserve chamber 100 at the input side. The gate valves are closed when a door is opened and opened when the inside of the reverse chamber 100 is evacuated. The substrate is moved into the neighboring chamber. For example, P-I-N type semiconductor layers are sequentially laminated by plasma vapor-phase reaction in each evacuated reaction chamber. The chambers are evacuated with VPs 34-37 through TPs 86-89. For example, in the reaction system l, a pressure adjusting valve 72 is closed, and the pressure in the reaction chamber 101 becomes 0.05-1Torr, or the pressure beneath the valve becomes 1X10<-2>Torr or less. The back flow of oxygen impregnated in the oil in the VP can be prevented by the operation of the TP. |
