发明名称 |
EDM PROCESS A METHOD AND APPARATUS FOR CONTROLLING THE FLOW RATE OF DIELECTRIC AS A FUNCTION OF GAP IMPEDANCE |
摘要 |
A method and apparatus for use in an EDM process for controlling the flow rate of dielectric through a machining gap as a function of the magnitude of gap impedance. An apparatus is provided for detecting variations in the magnitude of gap impedance and producing an output signal representative thereof. The variations in gap impedance are used to change the flow rate of dielectric through the gap. The flow rate may increase thus cleansing the gap of debris, or it may decrease and create a limited concentration of debris to facilitate the breakdown of the gap.
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申请公布号 |
US3699303(A) |
申请公布日期 |
1972.10.17 |
申请号 |
USD3699303 |
申请日期 |
1970.10.15 |
申请人 |
CINCINNATI MILACRON INC. |
发明人 |
HARRY D. KAUFFMAN;MALCOLM F. DAVIS |
分类号 |
B23H1/02;(IPC1-7):B23P1/08 |
主分类号 |
B23H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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