发明名称 ELECTRON BEAM APPARATUS
摘要 PURPOSE:To improve the accuracy by correcting deflection of secondary electrons due to the deflection of electron beam in an electron beam apparatus having an energy analyzer for detecting the potential of specimen comprising a take-out electrode, a deceleration electrode, a deflector, etc. arranged for an objective lens. CONSTITUTION:The secondary electrons emitted from a specimen 4 are passed through a take-out electrode 8 and a deceleration electrode 9 arranged for an objective lens 3 then detected through a detector 7. Here, deflection signals (x), (y) are fed through drivers 11, 12 to a deflector 5 while to the amplifiers 13, 14 to be amplified. Then predetermined constant voltage is added through adder/amplifiers 15, 16 to provide (x) and (y) signals to repspective grid 7a of a pair of detectors 7 arranged while crossing perpendicularly with the advancing axis of electron beam then the outputs are amplified through an amplifier 17 and fed to a CRT. Consequently, the deflection of secondary electrons caused through deflection of electron beam can be correct resulting in highly accurate potential measurement.
申请公布号 JPS61220259(A) 申请公布日期 1986.09.30
申请号 JP19850061238 申请日期 1985.03.26
申请人 FUJITSU LTD 发明人 ITO AKIO;OKUBO KAZUO;GOTO YOSHIAKI;ISHIZUKA TOSHIHIRO;OZAKI KAZUYUKI
分类号 H01L21/66;G01R31/302;H01J37/244;H01J37/28;H01L21/30 主分类号 H01L21/66
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