发明名称 |
LIQUID PHASE EPITAXY APPARATUS |
摘要 |
<p>A sliding boat liquid phase epitaxy apparatus comprises a base 1, substrate support means 2 disposed on the base 1 and fixed in a horizontal sense with respect to the base 1, and a slidable well member 3 abutting and disposed above the substrate support means 2, and having at least one well 17 capable of holding growth solution 21. A significant problem in growth of layers by liquid phase epitaxy when using a sliding boat apparatus is to achieve sufficiently good wipe-off so as to produce a layer having a smooth surface. This apparatus uses substrate support means 2 comprising a block 6 provided with a flat-bottomed recess 7 in part of the top surface of the block 6 between the ends of the block 6, and a plate 8 fitting into the recess 7 so that the top surface of the plate 8 is level with the top surface of the block 6 outside the recess 7, which plate 8 is provided with an aperture 9 capable of containing a substrate 20 on which an epitaxial layer is to be grown and can be disposed under the well 17. The plate 3 and well member 3 are made of different materials.</p> |
申请公布号 |
CA1229291(A) |
申请公布日期 |
1987.11.17 |
申请号 |
CA19840452809 |
申请日期 |
1984.04.26 |
申请人 |
N.V.PHILIPS'GLOEILAMPENFABRIEKEN |
发明人 |
BRICE, JOHN C.;PAGE, JOHN L.;WHIFFIN, PETER A.C. |
分类号 |
H01L21/208;C30B19/06;(IPC1-7):C30B15/10 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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