| 摘要 |
PURPOSE:To provide the photomask having an excellent light shielding function and fineness by providing the other light shielding film on the rear surface of a transparent substrate in the state of superposing this film on the light shielding film on a front surface side so as to allow the shielding of the light transmitted through the pinholes of the light shielding film on the front surface side. CONSTITUTION:This photomask is provided with the light shielding film 3 patterned to a desired state on the rear surface of the transparent substrate 2, and provided with the other light shielding film 3a in superposition on the light shielding film 3 on the front surface side so as to allow the shielding of the light transmitted through the pinholes of the film 3 on the front surface side in the rear surface position of the transparent substrate 2. Since the light shielding films 3, 3a are discretely provided on both the front and rear surfaces of the transparent substrate 2 in this case, the light transmitted through the pinholes at the time of the pattern transfer to a wafer, glass substrate, etc., is shut off by the light shielding film 3a on the rear surface side even if the pinholes exist in the light shielding film 3 on the front surface side. The photomask optimum for various kinds of the pattern forming operations for which the high fineness is required without allowing the undue transmission of the light for transfer through the photomask via the pinhole of the light shielding films. |
