| 摘要 |
A method of monitoring the concentration of certain plating bath major constituents such as acid is provided which is insensitive to the effects of hydrogen produced during plating. The method involves applying an ac signal superimposed on a dc potential to a sensing electrode in contact with the solution, producing an ac response current. The steady state value of the ac response current is then measured and provides an accurate indication of the acid concentration within the solution. The method can be performed using a single sensing electrode. Furthermore, the method complements and is easily integrated with known voltammetric techniques and equipment suitable for analysis of other plating bath constituents.
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