METHODS AND COMPOSITIONS FOR FORMING SILICA, GERMANOSILICATE AND METAL SILICATE FILMS, PATTERNS AND MULTILAYERS

摘要

This invention is directed to novel silica compositions, metal silicates, germanosilicates, and metal germanosilicates, and patterned objects and films comprising the same. It also includes methods and compositions for making these films and patterned objects on substrates, ranging from silicon wafers to optical fibers, silica, sapphire, quartz and borosilicate glass. These methods incorporate the use of certain precursor compositions, procedures for their application to a substrate and subsequent treatment to produce a patterned object and/or the conversion to glass structures.