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发明名称
METHOD OF FORMING FINE CONTACT HOLE OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR0168358(B1)
申请公布日期
1999.02.01
申请号
KR19950052727
申请日期
1995.12.20
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, SEUNG-INN;SHIN, YUN-SEUNG
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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