发明名称 Photo-lithographic mask having total internal reflective surfaces
摘要 A photo-lithographic mask includes a flexible, optically transparent body having an optically transmissive first surface for receiving an optical signal, and a second surface opposite the first surface having grooves for internally reflecting first portions of the optical signal and for allowing second portions of the optical signal to be transmitted through the second surface when the second surface is pressed against a wafer. The body consists essentially of silicone. The grooves have a saw tooth profile that are configured at an angle that exceeds the critical angle of the silicone with respect to the direction of the incoming optical signal.
申请公布号 US6395435(B1) 申请公布日期 2002.05.28
申请号 US20000605036 申请日期 2000.06.27
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY 发明人 COWEN STEVEN J.;KAGAN MICHAEL A.
分类号 G03F1/14;(IPC1-7):G03F9/00 主分类号 G03F1/14
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