| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a system for further increasing an inspection speed of an inspection apparatus in an SEM system, namely for increasing throughput. <P>SOLUTION: The inspection apparatus for inspecting the surface of a substrate creates a crossover from electrons generated from an electron source 25-1, then, an image is formed with a desired magnification in the direction of a sample W, and the crossover is created. When the crossover is passed, an electron that becomes noise is removed from the crossover by an aperture, the crossover is set to have a desired magnification, an adjustment is made so that the crossover becomes a parallel electron beam, and a substrate is irradiated with light in a desired sectional shape. Electron rays are created so that irregularities in illumination in the electron rays is 10% or less. Electrons discharged from the sample W are detected by a detector 25-11. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
