| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for spacers capable of suppressing stain of a photomask, etc., due to sublimation of a radiation sensitive polymerization initiator component, producing no in-liquid foreign substance, having high sensitivity and high resolution, and capable of forming spacers excellent in the shape of a cross section, compressive strength, rubbing resistance and adhesiveness to a transparent substrate. <P>SOLUTION: The radiation sensitive resin composition for forming spacers contains (A) a copolymer of an unsaturated carboxylic acid (anhydride), an epoxy-containing unsaturated compound and another unsaturated compound, (B) a polymerizable unsaturated compound, and (C) a radiation sensitive polymerization initiator containing a compound represented by formula (1) as an essential component, wherein R<SP>1</SP>denotes alkyl; R<SP>2</SP>and R<SP>3</SP>each denotes H, alkyl or benzyl; R<SP>4</SP>, R<SP>5</SP>, R<SP>7</SP>and R<SP>8</SP>each denotes H, halogen, alkyl or alkoxyl; and R<SP>6</SP>denotes halogen, alkyl, alkoxyl or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
