发明名称 |
PLASMA PROCESSING APPARATUS |
摘要 |
A dry etching apparatus (11) is provided with a vacuum container (12) wherein an object (1) to be processed is arranged on a bottom wall side in an internal space (15); a plasma generating coil (36), which is arranged on an outer side upper part of the vacuum container (12) and is provided with a conductor (37) arranged to form a space (39A) in a plane view; a top wall (16), which closes an upper part of the internal space (15) and is provided with a transparent section (30) at a position corresponding to the space (39A) between the conductors (37) of the coil (36) in the plane view; and a camera (45), which is arranged at the upper part of the coil (36) and includes at least a part of the object in a view field through the space (39A) and the transparent section (30). The status of the object during plasma processing can be observed in real time. |
申请公布号 |
KR20070089711(A) |
申请公布日期 |
2007.08.31 |
申请号 |
KR20077014412 |
申请日期 |
2007.06.25 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
HIROSHIMA MITSURU;MIYAKE SUMIO;OKUNE MITSUHIRO;WATANABE SHOZOH;SUZUKI HIROYUKI |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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