发明名称 INTEGRATED CIRCUIT SYSTEM WITH CLEAN SURFACES
摘要 An integrated circuit system includes providing an integrated circuit wafer; applying a first cleaning solution over the integrated circuit wafer; and applying a second cleaning solution over the integrated circuit wafer to prevent or remove a defect resulting from the first cleaning process.
申请公布号 US2008069958(A1) 申请公布日期 2008.03.20
申请号 US20070854972 申请日期 2007.09.13
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 GOH YIN-MIN FELICIA;ISMAIL ZAINAB;TAN YONG SIANG;TAN LING ZHI;CHIEW SIN PING
分类号 B05D3/10;B08B3/08 主分类号 B05D3/10
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