| 摘要 |
A pattern designing method in a reducing process is provided to prevent the generation of abnormal patterns which may be generated during the OPC process, by removing a pattern, not having an incline plane of 45 degrees, or jog pattern in advance. The database of a cell having the hierarchical structure is inputted to a computer(S1). A merged design pattern is formed according as data of a lower layer moves to the uppermost layer to which the lower layer belongs(S2). The design pattern is reduced in a desired ratio(S3). Data passing through the step 3 is outputted, and then the MDP(Mask Data Processing) processing is performed for the data(S4). The layer of data passing through the step 4 is reconfigured(S5). The OPC processing is performed for data passing through the step 5(S6).
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