发明名称 Method for designing coupling-function based millimeter wave electrical elements
摘要 A method for designing a coupling-function based millimeter wave electrical element. The method comprises computing a length of a first metal line and a second metal line; computing a first number of turns for the first metal line and a second number of turns for the second metal line; determining a width value of each of the first metal line and the second metal line; determining a spacing value between the first metal line and the second metal line; winding the first metal line on a first metal layer according to the first number of turns and winding the second metal line on the first metal layer and, in part, on a second metal layer according to the second number of turns, thereby resulting in a spiraled structure; and setting ports for the spiraled structure to form a complete design of the millimeter wave electrical element.
申请公布号 US9431992(B2) 申请公布日期 2016.08.30
申请号 US201414286566 申请日期 2014.05.23
申请人 Qualcomm Incorporated 发明人 Yehezkely Alon
分类号 H03H7/48;H03H7/21;H01F5/00;H01P5/18;H04B1/58;H03H1/00 主分类号 H03H7/48
代理机构 代理人
主权项 1. A method for fabricating an apparatus, comprising: winding a first strip of conductive material on a first layer of a multi-layer substrate of the apparatus according to a first number of turns to form a first inductor; winding a second strip of conductive material on the first layer of the multi-layer substrate and, in part, on a second layer of the multi-layer substrate according to a second number of turns to form a second inductor, wherein the first strip of conductive material and the second strip of conductive material are wound to form a spiraled structure such that the second strip of conductive material is magnetically coupled with the first strip of conductive material; forming a third strip of conductive material around the first inductor and the second inductor on a third layer of the multi-layer substrate as viewed from a perspective perpendicular to the third layer, wherein a first part of the third strip of conductive material is shorted to a second part of the third strip of conductive material via a fourth strip of conductive material, wherein the first inductor and the second inductor overlap the fourth strip of conductive material as viewed from a perspective perpendicular to the third layer, and wherein the third strip of conductive material is used to provide a reference potential for a circuit comprising the first inductor and the second inductor; and setting ports for the spiraled structure.
地址 San Diego CA US