发明名称 EXPOSURE PROCESS AND APPLICABLE ALIGNER AND MASK
摘要 <p>PURPOSE:To make the contrast between projected images sharper by a method wherein the phases of two lights immediately after passing through different positions on a mask are brought into inverse phases to each other and then said two lights are synthesized to irradiate an objective specimen. CONSTITUTION:The light L emitted from a light source 2 is divided into two lights L1, L2 and then the optical path length of these two lights L1, L2 reaching a mask 14 is changed so that the phases of the two lights immediately after passing through the different positions in the mask 14 may be brought into inverse phases to each other. When an objective specimen 3 is irradiated with the two synthesized lights L1, L2 with one light L1 passing through one specific transmission region while the other light L2 passing through the other transmission region on the mask 14 approach each other on the arranged position of the irradiated specimen 3, said two lights L1, L2 interfere with each other to be turned lower in the boundary region thereof. Through these procedures, the contrast between the projected images can be made sharper.</p>
申请公布号 JPH03270213(A) 申请公布日期 1991.12.02
申请号 JP19900071266 申请日期 1990.03.20
申请人 HITACHI LTD 发明人 OKAMOTO YOSHIHIKO
分类号 G03F1/29;G03F1/68;G03F1/80;G03F7/20;H01L21/027;H01L21/30 主分类号 G03F1/29
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