发明名称 |
STRAINED SUPERLATTICE SEMICONDUCTOR STRUCTURE |
摘要 |
A semiconductor structure for a light-interactive semiconductor device includes first and second crystalline semiconductor cladding layers having a first lattice constant and a strained superlattice structure disposed in contact with and between the first and second cladding layers and including alternating first crystalline semiconductor quantum barrier layers having a first energy band gap and a second lattice constant and second crystalline semiconductor quantum well layers having a second energy band gap less than the first energy band gap and a third lattice constant wherein the first lattice constant is approximately equal to the average of the second and third lattice constants and the second lattice constant differs from the third lattice constant by at least about 0.5 percent of the second lattice constant. <IMAGE> |
申请公布号 |
EP0457571(A3) |
申请公布日期 |
1992.01.02 |
申请号 |
EP19910304364 |
申请日期 |
1991.05.15 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
YOSHIDA, NAOHTIO |
分类号 |
H01S5/00;B82Y20/00;H01L31/0352;H01S5/32;H01S5/34 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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