| 摘要 |
A method of manufacture of a microminiature vacuum tube comprises the etching of a monocrystalline substrate (1) by an anisotropic etching operation in order to form a cavity having a V-shaped cross- section, the deposition of a cathode material (4) in the cavity, the formation of films of insulator, of a grid material and of an anode material on the opposite face of the substrate, the removal of that part of the latter which faces the V-shaped cavity, and the etching of the substrate until the appearance of the tip of the cathode material (4). It is thus possible to obtain cathodes of constant shape for microminiature vacuum tubes incorporated in a semiconductor substrate. <IMAGE>
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