| 摘要 |
PURPOSE:To obtain good images free from crosstalks even under irradiation with strong light if the optical modulating element is a light scattering type by forming a light reflection preventive layer on the surface of an active matrix substrate on the side opposite from the surface disposed with active elements. CONSTITUTION:The reflection preventive film 8 is formed on the surface of the active matrix substrate on the side opposite from the surface disposed with the active elements 2. The material and structure of such reflection preventive film 8 are satisfactory if MgF2, Na3AlF6, CaF2, BaF2, etc., are formed in one layer at thicknesses from several tens nm to several hundreds nm. Among these materials, the MgF2 is more preferable. For example, the MgF2 is formed at about 80 to 120nm in the case of the reflection prevention of a visible region. The incident light advancing in this liquid crystal cell progresses to the outside of the cell as it is without reflecting on an exit surface and returning again to the inside of the cell. Then, the incident light does not arrive at the active element 2 parts and, therefore, the increase in the leak current is obviated and the degradation in the contrast of the images is not induced. |
