| 摘要 |
PURPOSE:To prevent a great difference in resist pattern size by providing a nozzle for developer injection with a driving mechanism and by moving the nozzle to scan the atomized developer, injected from the nozzle, on a photoresist film. CONSTITUTION:A nozzle 5 is made by a driving device 6 to oscillate on a fulcrum 5a so that an atomized developer from its injection outlet scans on a resist surface 2a. In this case, a chromium plate 2 coated with resist to be developed is held in a rotary chuck and the developer is injected by the driving device 6 on the resist surface on the chrominum plate 2 in a fan shape. Consequently, the developer never gathers more at the peripheral part of the rotation than at the center part unlike a conventional spray system to advance the development uniformly, and variance in a substrate is reduced as much as possible. |
