| 摘要 |
PURPOSE:To provide the titled apparatus showing superior performance especially during the sputtering of a magnetic material by adopting a structure giving an intense magnetic field which is as parallel as possible to a face of the anode in the vicinity of the anode. CONSTITUTION:The sputtering cathode 11 of a magnetron sputtering apparatus is made of ferromagnetic Co-Ni material, and the anode 12 of nonmagnetic stainless steel. The anode 12 is cylindrical, yet it is deformed so as to obtain the highest parallelism to a magnetic field. A vertically magnetized cylindrical magnet 13 is kept equal to the anode 12 in potential. The magnetic sputtering apparatus thus constructed has enhanced sputtering efficiency as compared to a case where no magnet is built in the anode section. Especially, when the cathode is made of magnetic material, a magnetic thin film of high quality can be formed at a much higher speed than the speed of a conventional sputtering apparatus with a magnetic device built in the cathode section alone. |
