| 摘要 |
PURPOSE:To enhance sensitivity to X-rays and to enable high-precision formation of a resist microimage by using a polymer having repeating structural units represented by the formula and specified mol.wt. and specified mol.wt. distribution. CONSTITUTION:The polymer to be used for the X-ray has repeating structural units each represented by the formula shown here in which as alkyl groups represented by X and R<1>-R<5>, methyl, ethyl, propyl, and butyl are enumerable, as alkyl halide represented by X, methyl chloride, methyl bromide, ethyl chloride, and propyl bromide are enumerable, and as halogen atoms represented by X, Y1, Y2, and R<1>-R<5>, chlorine, bromine, iodine, and fluorine atoms are enumerable. High mol.wt. of the polymer is preferable from the view point of retaining high sensitivity performance to X-rays, but low mol.wt. is preferable in respect of handling in forming a film by coating as a resist. |
