发明名称 PATTERN POSITION ALIGNING METHOD
摘要 PURPOSE:To shorten an adjusting time; by providing a target center of each target mark on the extend line of a scribe line from the center in the longitudinal direction between elements, providing manual alignment marks on the extended lines from chip centers, and performing offset adjustment. CONSTITUTION:Target centers TC of target marks 4 in key patterns 1 and 2 are alignment with scribe centers SC. Manual alignment marks 3...3 are provided at a blank part of each element pattern 5 or on scribe lines 6 in the lateral direction on the extended parts from neighboring chip centers C. When, a pair of objective lenses are moved to the inside from the target centers TC, by (l) the manual alignment mark 3 at the chip center C of each element pattern 5 on the right side is observed on the side of the key pattern 1, and the manual alignment mark 3 at the chip center C of each element pattern 5 on the left side on the side of the key pattern 2 is observed. When the lenses are moved to the outside from the target centers TC by (l), the manual alignment marks 3...3 on the opposite side can be simultaneously observed. Thus the offset adjusting time can be shortened.
申请公布号 JPS62193124(A) 申请公布日期 1987.08.25
申请号 JP19860034229 申请日期 1986.02.19
申请人 SANYO ELECTRIC CO LTD 发明人 KANEKO MAMORU
分类号 G03F9/00;H01L21/027;H01L21/30;H01L21/67;H01L21/68 主分类号 G03F9/00
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