| 摘要 |
Polymeric .beta.-keto-ester acetals which, in combination with compounds which release acid under the action of actinic radiation, are suitable as positive photoresists, which are suitable for the production of printing plates, printed circuit boards, integrated circuits or silver-free films, can be prepared by free-radical polymerization from compounds of the formula I or II <IMG> (I) <IMG> (II) in which n is zero, 1 or 2 and, for example, R1 is an H atom, C1-C10-alkyl, phenyl or benzyl, R2, R3, R4, R5, R6, R7 and R3 independently of one another are each an H atom, halogen atom, C1-C10alkyl, phenyl, naphthyl or the radical -COOR9, <IMG> or -SO2R9, in which R9 is C1-C6alkyl or phenyl, X is O, S or NR10, in which R10 is an H atom, C1-C6alkyl or phenyl, Y is a radical of the following formulae <IMG> , <IMG> , <IMG> , <IMG> , <IMG> , <IMG> , <IMG> or <IMG> in which R11 is an H atom, C1-C6alkyl or phenyl and Z is an aliphatic radical containing at least two methylene groups, and R12 and R13 independently of one another are each C1-C10alkyl, phenyl or naphthyl.
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