| 摘要 |
<p>PURPOSE:To reduce particles caught by a step and not removed by cleaning the photomask while the rotating direction of a brush is set to either 0, 90, 45, or 135 deg. at all times and scrubbing the photomask with the brush along the step between the pattern part and blank glass part of the photomask. CONSTITUTION:Sponge 3 is moved on a rail 4 while rotated to scrub the photomask 1. Further, the rail 4 is rotated by 45 deg. around the surface center of the photomask, which is scrubbed to apply the brush 3 in directions parallel to the all edges of the pattern on the photomask 1. Consequently, no dust is produced owing to the mutual contacting or the brush 3, so the cleaning effect is improved.</p> |
