NEW MONOMER, COPOLYMER OF NEW MONOMER, PHOTORESIST COMPOSITION USING THE SAME AND METHOD FOR MANUFACTURING THE SAME

摘要

PURPOSE: A new monomer, a copolymer of new monomer, a photoresist composite ion using the same, and a method for manufacturing the same are provided to supply a new monomer having a prominent adhesive strength, a copolymer of the monomer, and a photoresist composite ion using the same by using a predetermined chemical expression. CONSTITUTION: A new monomer is formed with a predetermined chemical expression. A copolymer of new monomer is formed with an another predetermined chemical expression comprising the monomer of the predetermined chemical expression. A method for manufacturing the same comprises the steps of: dissolving a compound in an organic solvent; removing the organic solvent from the resulted solution; neutralizing and extracting the resulted solution; and re-crystallizing the extracted solution in a re-crystallizing solution.