发明名称 |
SEMICONDUCTOR APPARATUS EQUIPPED WITH STRESS RELAXATION LAMINATED MATERIAL AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: An apparatus is provided to prevent a crack of a conductive layer due to a stress by forming grooves in a surface of the conductive layer to disperse the stress. CONSTITUTION: An interlayer insulation membrane(42) is formed on a substrate and a conductive patterns(44b) is formed on the interlayer insulation membrane(42). Grooves(46) with a narrower width than a distance between the conductive patterns(44b) are formed on the conductive patterns(44b). The grooves(46) are formed in a semi-sphere or a semi-ellipse shape. The widths of grooves(46) are less than one half of the distance between the conductive patterns(44b). The grooves(46) disperse a stress applied to the conductive layer. |
申请公布号 |
KR20000024999(A) |
申请公布日期 |
2000.05.06 |
申请号 |
KR19980041862 |
申请日期 |
1998.10.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
AHN, JONG HYUN;LEE, CHANG HUN |
分类号 |
H01L21/28;H01L23/528;H05K1/02;H05K3/46;(IPC1-7):H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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