发明名称 SEMICONDUCTOR APPARATUS EQUIPPED WITH STRESS RELAXATION LAMINATED MATERIAL AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: An apparatus is provided to prevent a crack of a conductive layer due to a stress by forming grooves in a surface of the conductive layer to disperse the stress. CONSTITUTION: An interlayer insulation membrane(42) is formed on a substrate and a conductive patterns(44b) is formed on the interlayer insulation membrane(42). Grooves(46) with a narrower width than a distance between the conductive patterns(44b) are formed on the conductive patterns(44b). The grooves(46) are formed in a semi-sphere or a semi-ellipse shape. The widths of grooves(46) are less than one half of the distance between the conductive patterns(44b). The grooves(46) disperse a stress applied to the conductive layer.
申请公布号 KR20000024999(A) 申请公布日期 2000.05.06
申请号 KR19980041862 申请日期 1998.10.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, JONG HYUN;LEE, CHANG HUN
分类号 H01L21/28;H01L23/528;H05K1/02;H05K3/46;(IPC1-7):H01L21/28 主分类号 H01L21/28
代理机构 代理人
主权项
地址