发明名称 |
Trench separator for self-defining discontinuous film |
摘要 |
A discontinuous film structure on a substrate, with an etch stop layer on the substrate, a separator layer with an opening formed therein on the etch stop layer and a discontinuous-as-deposited film on the separator layer, the discontinuity substantially in register with the opening. The structure is made into a stacked capacitor with the discontinuous film being the bottom electrode, by forming a continuous dielectric layer on the bottom electrode and a continuous top electrode layer on the dielectric layer.
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申请公布号 |
US6150230(A) |
申请公布日期 |
2000.11.21 |
申请号 |
US19990320533 |
申请日期 |
1999.05.26 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KOTECKI, DAVID E.;MA, WILLIAM H. |
分类号 |
H01L21/02;H01L27/08;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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