发明名称 HOTPLATE UNIT
摘要 <p>PROBLEM TO BE SOLVED: To provide a hotplate unit which can prevent a semiconductor wafer position shift by sucking and fixing the semiconductor wafer on a ceramic plate. SOLUTION: The hotplate unit is composed of a ceramic plate either on or inside of which, a heating resistor is formed, and a supporting container supporting the ceramic plate. Through holes to suck the semiconductor wafer put on the ceramic heater are formed to the ceramic plate, and a suction means sucking the air inside the supporting container is installed to the supporting container.</p>
申请公布号 JP2002260829(A) 申请公布日期 2002.09.13
申请号 JP20010053037 申请日期 2001.02.27
申请人 IBIDEN CO LTD 发明人 MAJIMA KAZUTAKA
分类号 H05B3/20;H01L21/027;H01L21/205;H01L21/31;H01L21/66;H01L21/68;H01L21/683;H05B3/16;H05B3/18;H05B3/68;(IPC1-7):H05B3/20 主分类号 H05B3/20
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