发明名称 SEMICONDUCTOR MEMORY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor memory device in which the separation of a photoresist film can be prevented when dividing a element isolation area. SOLUTION: An element to be formed in a dummy element area 1e and an element area 1b in a proximity effect absorption area A does not contribute to storage of data as a dummy element. Consequently, the influence of an proximity effect is absorbed in this portion, and the influence of the proximity effect does not attain to a memory element in a memory cell array area B as is the case with a DRAM adopting a conventional half cell. Moreover, despite of a formed auxiliary part 1d, the size of the proximity effect absorption area A does not enlarge a chip size even when compared with a conventional chip because the size of the proximity effect absorption area A does not influence at all length in the extending direction of the element area 1b.</p>
申请公布号 JP2002328458(A) 申请公布日期 2002.11.15
申请号 JP20010129834 申请日期 2001.04.26
申请人 NEC MICROSYSTEMS LTD 发明人 KINOSHITA MASAAKI
分类号 G03F1/36;G03F1/68;H01L21/8242;H01L27/108;(IPC1-7):G03F1/08;H01L21/824 主分类号 G03F1/36
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