发明名称 Method for Manufacturing Bonded Wafer and Bonded Wafer
摘要 The present invention provides a method for manufacturing a bonded wafer prepared by bonding a base wafer and a bond wafer, comprising at least a step of etching an oxide film in a terrace region in an outer periphery of the bonded wafer wherein the oxide film in the terrace region is etched by spin-etching with holding and spinning the bonded wafer. Thereby, there is provided a method for manufacturing a bonded wafer in which an oxide film formed in a terrace region of a base wafer is efficiently etched without removing an oxide film on the back surface of the base wafer.
申请公布号 US2008315349(A1) 申请公布日期 2008.12.25
申请号 US20050883816 申请日期 2005.11.02
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 TAKEI TOKIO;YOSHIZAWA SIGEYUKI;MIYAZAKI SUSUMU;YOKOKAWA ISAO;NOTO NOBUHIKO
分类号 H01L21/762;H01L27/12 主分类号 H01L21/762
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