| 摘要 |
A gate recess and a method for forming a gate are provided to reduce a process cost by not requiring an additional electronic beam lithography process. A first resist layer(110) is formed on a substrate(100). A pattern of a gate foot is formed in the first resist layer. A second resist layer(150) is formed on the first resist layer. The pattern of the gate head is formed in the second resist layer. The substrate is etched. The pattern of the gate foot inclines to a source(130) and forms a gamma gate pattern.
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