发明名称 GaN-based quantum dot visible laser
摘要 A III-nitride based quantum dot (QD) laser is formed of InGaN/GaN quantum dots and capable emitting at a single wavelength within the visible region, including the violet wavelength region (400-440 nm), the blue wavelength region (440-490 nm), the green wavelength region (490-570 nm), the yellow wavelength region (570-590 nm), the orange wavelength region (590-620 nm), and the red wavelength region (620-700 nm), with varying composition as described.
申请公布号 US9362719(B2) 申请公布日期 2016.06.07
申请号 US201213721930 申请日期 2012.12.20
申请人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN 发明人 Bhattacharya Pallab;Zhang Meng
分类号 H01S5/343;H01S5/30;H01S5/34;B82Y20/00;B82Y40/00;H01S5/02;H01S5/028;H01S5/20;H01S5/32 主分类号 H01S5/343
代理机构 Marshall, Gerstein & Borun LLP 代理人 Marshall, Gerstein & Borun LLP
主权项 1. A laser comprising: a contact layer structure for injecting conduction carriers into an active region of the laser; a semiconductor optical waveguide structure; a laser cavity; and a GaN-based quantum dot layer structure within the laser cavity and configured as the active region of the laser, the quantum dot layer structure comprising at least one layer of quantum dots each positioned and sized in a self-organizing manner to produce (i) an array of self-organized quantum dots extending the entire at least one layer and characterized by strain relaxation induced from the self-organizing and (ii) a laser emission having a wavelength of 490 nm-570 nm from the laser cavity structure and the quantum dot layer structure being configured to produce, in response to injection of the conduction carriers into the active region via the contact layer structure, the laser emission having a linewidth of 1 nm or smaller, the at least one layer of quantum dots exhibiting an wavelength shift on the laser emission of no more than about 5 nm over a range of injection currents from an initial injection current to a threshold current of the at least one layer of quantum dots, wherein the laser is characterized by a threshold injection current density of 1.2 kA/cm2.
地址 Ann Arbor MI US