发明名称 Columnar crystal containing light emitting element and method of manufacturing the same
摘要 A method of manufacturing a semiconductor element by forming, on a substrate, columnar crystals of a nitride-base or an oxide-base compound semiconductor, and by using the columnar crystals, wherein on the surface of the substrate, the columnar crystals are grown while ensuring anisotropy in the direction of c-axis, by controlling ratio of supply of Group-III atoms and nitrogen, or Group-II atoms and oxygen atoms, and temperature of crystal growth, so as to suppress crystal growth in the lateral direction on the surface of the substrate.
申请公布号 US9362717(B2) 申请公布日期 2016.06.07
申请号 US200511574386 申请日期 2005.08.30
申请人 SOPHIA SCHOOL CORPORATION 发明人 Kikuchi Akihiko;Kishino Katsumi
分类号 H01L33/00;H01S5/183;B82Y20/00;C30B25/02;C30B29/16;C30B29/40;C30B29/60;C30B23/00;H01L21/02;H01L33/08;H01S5/02;H01S5/04;H01S5/32;H01S5/34;H01S5/343;H01L33/18 主分类号 H01L33/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A semiconductor element comprising: a substrate; a plurality of columnar crystals arranged on said substrate according to a predetermined density, and in which a device structure is formed; wherein each of the plurality of columnar crystals comprises an n-type cladding layer, an i-type blocking layer, a light emitting layer, and a p-type cladding layer arranged in this order from the substrate, or each of the plurality of columnar crystals comprises an n-type cladding layer, a light emitting layer, an i-type blocking layer, and a p-type cladding layer arranged in this order from the substrate, wherein a material of the p-type cladding layer comprises p-GaN:Mg or p-AlGaN:Mg, a material of the i-type blocking layer comprises intrinsic GaN, a material of the n-type cladding layer comprises n-GaN:Si or n-AlGaN:Si, and the light emitting layer has a single-quantum well structure comprising InxGa1-xN/InyGa1-yN or AlxGa1-xN/AlyGa1-yN or a multiple-quantum well structure comprising multiple alternating layers comprising InxGa1-xN/InyGa1-yN or AlxGa1-xN/AlyGa1-yN; and wherein the p-type cladding layer has a truncated reverse cone shape; wherein upper surfaces of the p-type cladding layers are fused together to form a two-dimensionally continuous thin film layer.
地址 Tokyo JP