发明名称 Photodetector and method for manufacturing the same
摘要 A photodetector includes a substrate and an insulating arrangement formed in the substrate. The insulating arrangement electrically insulates a confined region of the substrate. The confined region is configured to generate free charge carriers in response to an irradiation. The photodetector further includes a read-out electrode arrangement configured to provide a photocurrent formed by at least a portion of the free charge carriers that are generated in response to the irradiation. The photodetector also includes a biasing electrode arrangement that is electrically insulated against the confined region by means of the insulating arrangement. The biasing electrode arrangement is configured to cause an influence on a spatial charge carrier distribution within the confined region so that fewer of the free charge carriers recombine at boundaries of the confined region compared to an unbiased state.
申请公布号 US9368654(B2) 申请公布日期 2016.06.14
申请号 US201514641472 申请日期 2015.03.09
申请人 Infineon Technologies AG 发明人 Kautzsch Thoralf
分类号 H01L31/0224;H01L31/102;H01L31/062;G01J3/50;H01L31/18 主分类号 H01L31/0224
代理机构 Eschweiler & Associates, LLC 代理人 Eschweiler & Associates, LLC
主权项 1. A method for manufacturing a photodetector, the method comprising: providing a semiconductor substrate having a main surface; forming an insulating arrangement within the substrate that electrically insulates a confined region of the substrate; forming a biasing electrode arrangement electrically insulated against the confined region by means of the insulating arrangement; and forming a read-out electrode arrangement comprising at least two electrodes contacting different portions of the confined region and being configured to provide a photocurrent formed by at least a portion of the free charge carriers that are generated in response to the irradiation.
地址 Neubiberg DE