发明名称 |
Photodetector and method for manufacturing the same |
摘要 |
A photodetector includes a substrate and an insulating arrangement formed in the substrate. The insulating arrangement electrically insulates a confined region of the substrate. The confined region is configured to generate free charge carriers in response to an irradiation. The photodetector further includes a read-out electrode arrangement configured to provide a photocurrent formed by at least a portion of the free charge carriers that are generated in response to the irradiation. The photodetector also includes a biasing electrode arrangement that is electrically insulated against the confined region by means of the insulating arrangement. The biasing electrode arrangement is configured to cause an influence on a spatial charge carrier distribution within the confined region so that fewer of the free charge carriers recombine at boundaries of the confined region compared to an unbiased state. |
申请公布号 |
US9368654(B2) |
申请公布日期 |
2016.06.14 |
申请号 |
US201514641472 |
申请日期 |
2015.03.09 |
申请人 |
Infineon Technologies AG |
发明人 |
Kautzsch Thoralf |
分类号 |
H01L31/0224;H01L31/102;H01L31/062;G01J3/50;H01L31/18 |
主分类号 |
H01L31/0224 |
代理机构 |
Eschweiler & Associates, LLC |
代理人 |
Eschweiler & Associates, LLC |
主权项 |
1. A method for manufacturing a photodetector, the method comprising:
providing a semiconductor substrate having a main surface; forming an insulating arrangement within the substrate that electrically insulates a confined region of the substrate; forming a biasing electrode arrangement electrically insulated against the confined region by means of the insulating arrangement; and forming a read-out electrode arrangement comprising at least two electrodes contacting different portions of the confined region and being configured to provide a photocurrent formed by at least a portion of the free charge carriers that are generated in response to the irradiation. |
地址 |
Neubiberg DE |