发明名称 LATERAL DOUBLE DIFFUSED MOS TRANSISTORS
摘要 A lateral double diffused MOS transistor including a substrate, a source region and a drain region disposed in the substrate, a first contact and a second contact connected to the source region and the drain region, respectively, a gate insulation layer and a gate electrode on the substrate, a first field plate extending from the gate electrode toward the drain region, a coupling gate disposed between the second contact and the first field plate on the substrate, the coupling gate having a coupling voltage by coupling operation with the second contact, and a second field plate disposed between the coupling gate and the first field plate on the substrate, the second field plate being electrically connected to the second field plate.
申请公布号 US2016211366(A1) 申请公布日期 2016.07.21
申请号 US201615082777 申请日期 2016.03.28
申请人 SK hynix Inc. 发明人 PARK Sung Kun
分类号 H01L29/78;H01L29/06;H01L29/40;H01L29/08 主分类号 H01L29/78
代理机构 代理人
主权项 1. A lateral double diffused MOS transistor, comprising: a substrate; a source region and a drain region disposed in the substrate; a first contact and a second contact connected to the source region and the drain region, respectively; a gate insulation layer and a gate electrode on the substrate; a first field plate extending from the gate electrode toward the drain region; a coupling gate disposed between the second contact and the first field plate on the substrate, the coupling gate having a coupling voltage by coupling operation with the second contact; and a second field plate disposed between the coupling gate and the first field plate on the substrate, the second field plate being electrically connected to the coupling gate.
地址 Icheon-si Gyeonggi-do KR
您可能感兴趣的专利