| 发明名称 |
MOVEABLE EDGE COUPLING RING FOR EDGE PROCESS CONTROL DURING SEMICONDUCTOR WAFER PROCESSING |
| 摘要 |
A substrate processing system includes a processing chamber and a pedestal arranged in the processing chamber. An edge coupling ring is arranged adjacent to a radially outer edge of the pedestal. A first actuator is configured to selectively move the edge coupling ring to a raised position, relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber. |
| 申请公布号 |
US2016211166(A1) |
申请公布日期 |
2016.07.21 |
| 申请号 |
US201514705430 |
申请日期 |
2015.05.06 |
| 申请人 |
Lam Research Corporation |
发明人 |
Yan Haoquan;O'Neill Robert Griffith;Casaes Raphael;McChesney Jon;Paterson Alex |
| 分类号 |
H01L21/687;H01L21/66;H01L21/67 |
主分类号 |
H01L21/687 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing system, comprising:
a processing chamber; a pedestal arranged in the processing chamber; an edge coupling ring arranged adjacent to a radially outer edge of the pedestal; and a first actuator configured to selectively move the edge coupling ring to a raised position relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber. |
| 地址 |
Fremont CA US |
