发明名称 Semiconductor device for reducing coupling capacitance
摘要 A semiconductor device includes a spacer having a nitride/oxide/nitride (NON) structure. The spacer is disposed between a sidewall of a bit line and a bit line contact and a sidewall of a storage node contact plug to reduce coupling capacitance between the bit line and a storage node contact plug and between the bit line contact and the storage node contact plug.
申请公布号 US9419002(B2) 申请公布日期 2016.08.16
申请号 US201414473139 申请日期 2014.08.29
申请人 SK HYNIX INC. 发明人 Han Ky Hyun;Park Chang Heon;Choi Dong Gu
分类号 H01L29/40;H01L27/11;H01L21/768;H01L27/108 主分类号 H01L29/40
代理机构 代理人
主权项 1. A semiconductor device comprising: a bit line contact; a bit line disposed on the bit line contact and electrically connected to the bit line contact; and a spacer disposed on a sidewall of the bit line contact and a sidewall of the bit line, wherein the spacer has a structure in which a first spacer with a first dielectric constant, a second spacer with a second dielectric constant, a third spacer with a third dielectric constant, and a protecting spacer with a fourth dielectric constant are stacked, the second spacer having a different dielectric constant from those of the first, third, and protecting spacers, the protecting spacer having a same dielectric constant as those of the first and third spacers, the protecting spacer capping a lower portion of the second spacer.
地址 Icheon KR