Solar cell and method for manufacturing same

摘要

A solar cell is provided with: an n-type region formed over a substrate; a p-type region formed over the substrate and the n-type region; and mark sets for judging positional deviation between the n-type region and the p-type region. The mark sets respectively include first marks, and second marks, which are formed within the first marks.

主权项

1. A solar cell comprising:
a first patterned layer formed over a semiconductor substrate; a second patterned layer formed over at least one of the semiconductor substrate and the first patterned layer; and a first mark set and a second mark set configured to judge a positional deviation between the first patterned layer and the second patterned layer, the second mark set being formed so as to not overlap the first mark set, wherein the first mark set comprises: a first mark formed by providing a recess on the first patterned layer or by leaving the first patterned layer with an island shape; and a second mark formed by providing a recess on the second patterned layer or by leaving the second patterned layer with an island shape, and formed to fit within the first mark; a first gap is provided between a first outline of the first mark and a second outline of the second mark; the second mark set comprises:
a first mark formed by providing a recess on the first patterned layer such that the first mark of the second mark set does not overlap the first mark of the first mark set or by leaving the first patterned layer with an island shape; anda second mark formed by providing a recess on the second patterned layer such that the second mark of the second mark set does not overlap the second mark of the first mark set or by leaving the second patterned layer with an island shape, and formed to fit within the first mark of the second mark set; and a second gap not overlapping the first gap and having a distance different from that of the first gap is provided between a first outline of the first mark of the second mark set and a second outline of the second mark of the second mark set.