| 摘要 |
A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of (a) lead-free amorphous borosilicate glass containing Al2O3, a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof containing Li2O and (b) an inorganic filler selected from quartz and mixtures of quartz with 0.5-5% wt. inert oxides having a TCE equal to or greater than 7. |
