| 发明名称 |
METHOD OF PREPARING A SUBSTRATE FOR LITHOGRAPHY, A SUBSTRATE, A DEVICE MANUFACTURING METHOD, A SEALING COATING APPLICATOR AND A SEALING COATING MEASUREMENT APPARATUS |
| 摘要 |
A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate. |
| 申请公布号 |
KR20090046740(A) |
申请公布日期 |
2009.05.11 |
| 申请号 |
KR20080109921 |
申请日期 |
2008.11.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;STAVENGA MARCO KOERT;WONG PATRICK;VAN DEN BOGAARD FREDERIK JOHANNES;DE VRIES DIRK;BESSEMS DAVID;MYCKE JACQUES ROGER ALICE |
| 分类号 |
H01L21/027;H01L21/66 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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