发明名称 Verfahren zum Herstellen eines Halbleiterbauelementes
摘要 An aluminum coating is applied to a flat surface of a body of semiconductor material. The body having at least two zones or regions of different or opposite type conductivity exposed at the flat surface. A surface of a metal support or contact member which is to be joined to the aluminum coated surface of the semiconductor body is coated with a silicon-aluminum alloy. The two surfaces are then brought together and the surfaces heated to a temperature just above the silicon-aluminum eutectic whereby the body of semiconductor material is joined to support or contact.
申请公布号 DE1803489(A1) 申请公布日期 1970.05.27
申请号 DE19681803489 申请日期 1968.10.17
申请人 SIEMENS AG 发明人 RAITHEL,DR.RER.NAT.KURT
分类号 H01L21/52;H01L21/00;H01L23/492 主分类号 H01L21/52
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